Journal
SUPERLATTICES AND MICROSTRUCTURES
Volume 107, Issue -, Pages 172-177Publisher
ACADEMIC PRESS LTD- ELSEVIER SCIENCE LTD
DOI: 10.1016/j.spmi.2017.03.052
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- Office of Naval Research Scientific Projects (ONR) [N62909-16-1-203]
- Masdar Institute of Science and Technology
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In this paper we study the effect of H-2/SiH4 dilution ratio (R) on the structural and optical properties of hydrogenated microcrystalline silicon embedded in amorphous matrix thin films. The thin films are prepared using standard RF-PECVD process at substrate temperature of 200 degrees C. The effect of hydrogen dilution ratio on the optical index of refraction and the absorption coefficient were investigated. It was observed that by incorporating higher hydrogen flow rate in the films with low SiH4 concentration, the optical index of refraction can be tuned over a broad range of wavelengths due to the variation of crystalline properties of the produced films. By varying the hydrogen flow of mu c-Si:H samples, 8% and 12% reduction in the index of refraction at 400 nm and at 1500 nm can be achieved, respectively. In addition a 78% reduction in surface roughness is obtained when 60sccm of H-2 is used in the deposition compared to the sample without any H2 incorporation. (C) 2017 Elsevier Ltd. All rights reserved.
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