Journal
2017 INTERNATIONAL CONFERENCE ON OPTICAL MEMS AND NANOPHOTONICS (OMN)
Volume -, Issue -, Pages 21-22Publisher
IEEE
Keywords
cryogenic silicon etching; Bosch process; x-ray gratings
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We report deep reactive ion etching of silicon gratings via cryogenic and Bosch processes. An aspect ratio of > 50 is achieved for 400 nm period gratings with both processes.
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