Journal
APPLIED SURFACE SCIENCE
Volume 426, Issue -, Pages 852-855Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.apsusc.2017.07.248
Keywords
Ruthenium oxidation states; Plasma deposition; Thin film; XPS; In-situ analysis
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Funding
- Polish National Science Center [DEC 2012/07/B/ST8/03670]
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A novel in-situ study of the surface molecular structure of catalytically active ruthenium-based films subjected to the oxidation (in oxygen) and reduction (in hydrogen) was performed in a Cat-Cell reactor combined with a XPS spectrometer. The films were produced by the plasma deposition method (PEMOCVD). It was found that the films contained ruthenium at different oxidation states: metallic (Ru-0), RuO2 (Ru+4), and other RuOx (Ru+X), of which content could be changed by the oxidation or reduction, depending on the process temperature. These results allow to predict the behavior of the Ru-based catalysts in different redox environments. (C) 2017 Elsevier B.V. All rights reserved.
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