4.3 Article

Influences of interfacial adhesion on gas barrier property of functionalized graphene oxide/ultra-high-molecular-weight polyethylene composites with segregated structure

Journal

COMPOSITE INTERFACES
Volume 24, Issue 8, Pages 729-741

Publisher

TAYLOR & FRANCIS LTD
DOI: 10.1080/09276440.2017.1269517

Keywords

Ultra-high-molecular-weight polyethylene; graphene oxide; composite film; interfacial adhesion; segregated structure; gas barrier property

Funding

  1. National Foundation of China [51573147, 51473102]
  2. Foundation of Shaanxi province [2015JM2073]
  3. Opening Project of State Key Laboratory of Polymer Materials Engineering (Sichuan University) [sklpme 2014-4-27]

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The segregated graphene oxide(GO)/ultra-high-molecular-weight polyethylene (UHMWPE) composite films with various interfacial adhesion property were prepared by mechanical blending method from UHMWPE, GO, dodecyl amine (DA) functionalized graphene oxide(DA-GO) or uniform DA-GO/high density polyethylene (DA-GO/ HDPE) powder. The results of XRD and XPS indicated that DA chain was successfully grafted onto GO sheets via a chemical method, which enhanced the interfacial adhesion between UHMWPE particles and GO sheets. The characterizations of POM and SEM proved that good segregated structure was only obtained in DA-GO/UHMWPE or DA-GO/HDPE/UHMWPE composite. Strong interfacial adhesion between fillers and matrix exhibits positive effect on gas barrier property. Compared to the GO/UHMWPE composite film, dramatic decrease in O-2 permeability coefficient by 42.2 and 48.1%, from 15.4 x 10(-14) to 8.9 x 10(-14) and 8.0 x 10(-14) cm(3) cm cm(-2) s(-1) Pa-1, is achieved upon the addition of only 0.5 wt% fillers, respectively. The DSC results demonstrated that the enhanced gas barrier performance was ascribed to the strong interfacial adhesion between DA-GO/ HDPE and UHWMPE matrix, rather than the crystallinity of UHWMPE matrix. Additionally, the decrease in UHMWPE particle size might be conducive to improving the gas barrier property of composite films due to the formation of more isolation layers perpendicular to the film plane.

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