4.5 Article

Comparison of three types of redox active polymer for two photon stereolithography

Journal

POLYMERS FOR ADVANCED TECHNOLOGIES
Volume 28, Issue 9, Pages 1194-1197

Publisher

WILEY
DOI: 10.1002/pat.3998

Keywords

poly(ferrocenylsilane); 3D-printing; nanolithography; two-photon stereolithography; polycation

Funding

  1. Netherlands Organization for Scientific Research [NWO 728.011.205]

Ask authors/readers for more resources

Three-dimensional printing and stereolithography of functional materials for nanofabrication have recently generated a big amount of interest, as have responsive materials. We have investigated the applicability of the redox-responsive polymer poly(ferrocenylsilane) (PFS) for stereolithography purposes. Three types of PFS were synthesized, each functionalized with specific properties to make them interesting for use in nanofabrication. These properties include various stiffness, crosslink densities and hydrophobicities. One of the three PFSs is polycationic, therefore resulting in a hydrogel structure. We show structures fabricated from these materials. Common challenges in using new materials such as these for two-photon stereolithography are discussed. (C) 2017 The Authors Polymers for Advanced Technologies Published by John Wiley & Sons Ltd

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.5
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available