4.6 Article

Ultrasmall in-plane photonic crystal demultiplexers fabricated with photolithography

Journal

OPTICS EXPRESS
Volume 25, Issue 2, Pages 1521-1528

Publisher

OPTICAL SOC AMER
DOI: 10.1364/OE.25.001521

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Funding

  1. Strategic Information and Communications R&D Promotion Programme (SCOPE), from the Ministry of Internal Affairs and Communications, Japan
  2. Grants-in-Aid for Scientific Research [16J05171] Funding Source: KAKEN

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We demonstrate ultrasmall demultiplexers based on photolithographic photonic crystals. The footprint of the demultiplexers is 110 mu m(2) per channel. Our in-plane demultiplexers are clad with silica, which makes them stable and easy to integrate with other silicon photonic devices. We describe two types of demultiplexers with spacings of 136 and 267 GHz between channels for application to dense wavelength division multiplexing. Integrated titanium nitride heaters allow us to precisely control the channel wavelength. We report a 2.5 Gbps transmittance experiment with sufficiently small crosstalk and discuss ways of achieving even lower crosstalk between channels. (C) 2017 Optical Society of America

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