Journal
OPTICAL MICROLITHOGRAPHY XXXI
Volume 10587, Issue -, Pages -Publisher
SPIE-INT SOC OPTICAL ENGINEERING
DOI: 10.1117/12.2292312
Keywords
chitosan; riboflavin; water developable resist; biopolymer; environmentally-friendly; photolithography; electron beam lithography; etching; green nanotechnology; green-tech
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Funding
- Pulsalys
- LABEX iMUST of Universite de Lyon, within the program Investissements d'Avenir [ANR-10-LABX-0064, ANR-11-IDEX-0007]
- EEA doctoral school
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Biopolymers represent natural, renewable and abundant materials. Their use is steadily growing in various areas (food, health, building.) but, in lithography, despite some works, resists, solvents and developers are still oil-based and hazardous chemicals. In this work, we replaced synthetic resist by chitosan, a natural, abundant and hydrophilic polysaccharide. High resolution sub-micron patterns were obtained through chitosan films as water developable, chemically unmodified, positive tone mask resist for an eco-friendly electron beam and deep-UV (193 nm) lithography process. Sub-micron patterns were also successfully obtained using a 248 nm photomasker thanks to the addition of bio-sourced photoactivator, riboflavin. Patterns were then transferred by plasma etching into silica even for high resolution patterns.
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