Journal
NATURE NANOTECHNOLOGY
Volume 13, Issue 1, Pages 24-+Publisher
NATURE PUBLISHING GROUP
DOI: 10.1038/s41565-017-0010-1
Keywords
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Funding
- Air Force Office of Scientific Research (AFOSR)/National Science Foundation (NSF) Two-Dimensional Atomic-layer Research and Engineering (2DARE) programme
- Army Research Office (ARO)
- Semiconductor Research Corporation (SRC)
- Emerging Frontiers & Multidisciplinary Activities
- Directorate For Engineering [1433459] Funding Source: National Science Foundation
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The so-called Boltzmann tyranny defines the fundamental thermionic limit of the subthreshold slope of a metal-oxide-semiconductor field-effect transistor (MOSFET) at 60 mV dec(-1) at room temperature and therefore precludes lowering of the supply voltage and overall power consumption(1,2). Adding a ferroelectric negative capacitor to the gate stack of a MOSFET may offer a promising solution to bypassing this fundamental barrier(3). Meanwhile, two-dimensional semiconductors such as atomically thin transition-metal dichalcogenides, due to their low dielectric constant and ease of integration into a junctionless transistor topology, offer enhanced electrostatic control of the channel(4-12). Here, we combine these two advantages and demonstrate a molybdenum disulfide (MoS2) two-dimensional steep-slope transistor with a ferroelectric hafnium zirconium oxide layer in the gate dielectric stack. This device exhibits excellent performance in both on and off states, with a maximum drain current of 510 mu A mu m(-1) and a sub-thermionic subthreshold slope, and is essentially hysteresis-free. Negative differential resistance was observed at room temperature in the MoS2 negative-capacitance FETs as the result of negative capacitance due to the negative drain-induced barrier lowering. A high on-current-induced self-heating effect was also observed and studied.
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