4.8 Article

Negative Photoconductance in Heavily Doped Si Nanowire Field-Effect Transistors

Journal

NANO LETTERS
Volume 17, Issue 11, Pages 6727-6734

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/acs.nanolett.7b02788

Keywords

Negative photoconductance; hot electron trapping; indirect band gap semiconductor; Si nanowire; interfacial trapping

Funding

  1. Initiative and Networking Fund of the Helmholtz Association of German Research Centers through the International Helmholtz Research School for Nano-electronic Networks (IHRS NANONET) [VH-KO-606]
  2. German Excellence Initiative via the Cluster of Excellence Center for Advancing Electronics Dresden (CfAED) [EXC1056]
  3. MSIP (Ministry of Science, ICT and Future Planning), Korea, under the ICT Consilience Creative Program [IITP-R0346-16-1007]

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We report the first observation of negative photoconductance (NPC) in n- and p-doped Si nanowire field-effect transistors (FETs) and demonstrate the strong influence of doping concentrations on the nonconventional optical switching of the devices. Furthermore, we show that the NPC of Si nanowire FETs is dependent on the wavelength of visible light due to the phonon-assisted excitation to multiple conduction bands with different band gap energies that would be a distinct optoelectronic property of indirect band gap semiconductor. We attribute the main driving force of NPC in Si nanowire FETs to the photogenerated hot electrons trapping by dopants ions and interfacial states. Finally, comparing back- and top-gate modulation, we derive the mechanisms of the transition between negative and positive photoconductance regimes in nanowire devices. The transition is decided by the competition between the light-induced interfacial trapping and the recombination of mobile carriers, which is dependent on the light intensity and the doping concentration.

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