Journal
NANO LETTERS
Volume 17, Issue 4, Pages 2697-2702Publisher
AMER CHEMICAL SOC
DOI: 10.1021/acs.nanolett.7b00607
Keywords
Site-selective growth; nanopillars; laser; InP; quantum well; InGaAs
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Funding
- NSF [1335609, ECCS-0939514]
- Singapore National Research Foundation Singapore-Berkeley Research Initiative for Sustainable Energy (SinBeRISE) Program [NRF-CRP14-2014-03]
- Directorate For Engineering [1335609] Funding Source: National Science Foundation
- Div Of Civil, Mechanical, & Manufact Inn [1335609] Funding Source: National Science Foundation
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In this Letter, we report the site-controlled growth of InP nanolasers on a silicon substrate with patterned SiO2 nanomasks by low-temperature metal-organic chemical vapor deposition, compatible with silicon complementary metal-oxide-semiconductor (CMOS) post-processing. A two-step growth procedure is presented to achieve smooth wurtzite faceting of vertical nanopillars. By incorporating InGaAs multiquantum wells, the nanopillar emission can be tuned over a wide spectral range. Enhanced quality factors of the intrinsic InP nanopillar cavities promote lasing at 0.87 and 1.21 mu m, located within two important optical telecommunication bands. This is the first demonstration of a site-controlled III-V nanolaser monolithically integrated on silicon with a silicon-transparent emission wavelength, paving the way for energy efficient on-chip optical links at typical telecommunication wavelengths.
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