Journal
NANO LETTERS
Volume 18, Issue 1, Pages 241-246Publisher
AMER CHEMICAL SOC
DOI: 10.1021/acs.nanolett.7b03988
Keywords
Ferroelectric phenomena; nonvolatile memories; zirconium oxide; metal oxide semiconductor devices
Categories
Funding
- National Science Foundation [DMR-1309868]
- MRSEC [DMR-1119826]
- NSF XSEDE [TG-MCA08X007]
- Direct For Mathematical & Physical Scien [1309868] Funding Source: National Science Foundation
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A single atomic layer of ZrO2 exhibits ferroelectric switching behavior when grown with an atomically abrupt interface on silicon. Hysteresis in capacitance-voltage measurements of a ZrO2 gate stack demonstrate that a reversible polarization of the ZrO2 interface structure couples to the carriers in the silicon. First-principles computations confirm the existence of multiple stable polarization states and the energy shift in the semiconductor electron states that result from switching between these states. This monolayer ferroelectric represents a new class of materials for achieving devices that transcend conventional complementary metal oxide semiconductor (CMOS) technology. Significantly, a single atomic layer ferroelectric allows for more aggressively scaled devices than bulk ferroelectrics, which currently need to be thicker than 5-10 nm to exhibit significant hysteretic behavior.
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