4.7 Article

Measuring the optical permittivity of two-dimensional materials without a priori knowledge of electronic transitions

Journal

NANOPHOTONICS
Volume 8, Issue 2, Pages 263-270

Publisher

WALTER DE GRUYTER GMBH
DOI: 10.1515/nanoph-2018-0120

Keywords

two-dimensional materials; refractive index; ellipsometry; optical materials; characterization techniques

Funding

  1. Samsung Science and Technology Foundation [SSTF-BA1401-05]
  2. Basic Science Research Program through the National Research Foundation of Korea (NRF) - Ministry of Education [2017R1A6A3A11034238]
  3. National Research Foundation of Korea [2017R1A6A3A11034238] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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We propose a deterministic method to measure the optical permittivity of two-dimensional (2D) materials without a priori knowledge of the electronic transitions over the spectral window of interest. Using the thin-film approximation, we show that the ratio of reflection coefficients for s and p polarization can give a unique solution to the permittivity of 2D materials within the measured spectral window. The uniqueness and completeness of our permittivity measurement method do not require a priori knowledge of the electronic transitions of a given material. We experimentally demonstrate that the permittivity of monolayers of MoS2, WS2, and WSe2 in the visible frequency range can be accurately obtained by our method. We believe that our method can provide fast and reliable measurement of the optical permittivity of newly discovered 2D materials.

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