Journal
MICROELECTRONIC ENGINEERING
Volume 178, Issue -, Pages 30-33Publisher
ELSEVIER
DOI: 10.1016/j.mee.2017.04.020
Keywords
RRAM devices; Admittance cycles; Hafnium oxide; Atomic layer deposition
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Funding
- FEDER program [TEC2014-52152-C3-3-R, TEC2014-52152-C3-1-R, TEC2014-54906-JIN]
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Similarly to the current, the admittance of TiN/Ti/HfO2/W-based resistive memories shows well-defined minor switching loops associated with partial transitions between the ON and OFF states. Excellent control of the intermediate states is achieved in these samples by means of a proper sequence of input signals and current compliances. It is shown that, as the resistance state of the conductive filament changes, the associated susceptance also exhibits multilevel response. Susceptance values are negative in the ON state, indicating an inductive behavior of the conductive filaments. (C) 2017 Elsevier B.V. All rights reserved.
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