4.5 Article

Simulation-based artifact correction (SBAC) for metrological computed tomography

Journal

MEASUREMENT SCIENCE AND TECHNOLOGY
Volume 28, Issue 6, Pages -

Publisher

IOP PUBLISHING LTD
DOI: 10.1088/1361-6501/aa666e

Keywords

CT artifact correction; cone-beam CT; industrial computed tomography; metrology

Funding

  1. AiF [KF2301004UW1]

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Computed tomography (CT) is a valuable tool for the metrolocical assessment of industrial components. However, the application of CT to the investigation of highly attenuating objects or multi-material components is often restricted by the presence of CT artifacts caused by beam hardening, x-ray scatter, off-focal radiation, partial volume effects or the cone-beam reconstruction itself. In order to overcome this limitation, this paper proposes an approach to calculate a correction term that compensates for the contribution of artifacts and thus enables an appropriate assessment of these components using CT. Therefore, we make use of computer simulations of the CT measurement process. Based on an appropriate model of the object, e.g. an initial reconstruction or a CAD model, two simulations are carried out. One simulation considers all physical effects that cause artifacts using dedicated analytic methods as well as Monte Carlo-based models. The other one represents an ideal CT measurement i.e. a measurement in parallel beam geometry with a monochromatic, point-like x-ray source and no x-ray scattering. Thus, the difference between these simulations is an estimate for the present artifacts and can be used to correct the acquired projection data or the corresponding CT reconstruction, respectively. The performance of the proposed approach is evaluated using simulated as well as measured data of single and multi-material components. Our approach yields CT reconstructions that are nearly free of artifacts and thereby clearly outperforms commonly used artifact reduction algorithms in terms of image quality. A comparison against tactile reference measurements demonstrates the ability of the proposed approach to increase the accuracy of the metrological assessment significantly.

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