Selective Al-Ti reactivity in laser-processed Al/Ti multilayers

Multilayers consisting of five (Al/Ti) bilayers were deposited on (100) silicon wafers. On top was deposited the Ti layer, aimed at preventing Al from diffusing to the surface upon laser treatment. The total thickness of the thin-film structure was 200 nm. Laser irradiations with Nd:YAG picoseconds laser pulses in the defocused regime were performed in air. Laser beam energy was 4 mJ and laser spot diameter on the sample surface was 3 mm (fluence 0.057 J cm(-2)). The samples were treated with different numbers of laser pulses. Structural characterizations were performed by different analytical methods and nano-hardness was also measured. Laser processing induced layer intermixing, formation of titanium aluminides, oxidation of the surface titanium layer and enhanced surface roughness. Aluminum appears at the sample surface only for the highest density of laser irradiation. Laser processing induces increment of nano-hardness by approximately 20% and decrease of residual Young's modulus for a few percentages from the starting value of the untreated samples. These results can be interesting toward achieving structures with a selective extent of Al-Ti reactivity in this multilayered system, within the development of biocompatible materials.