4.7 Article

Photoinitiated Polymerization-Induced Self-Assembly of Glycidyl Methacrylate for the Synthesis of Epoxy-Functionalized Block Copolymer Nano-Objects

Journal

MACROMOLECULAR RAPID COMMUNICATIONS
Volume 38, Issue 15, Pages -

Publisher

WILEY-V C H VERLAG GMBH
DOI: 10.1002/marc.201700195

Keywords

diblock copolymer; epoxy-functional; photo-PISA; poly(glycidyl methacrylate)

Funding

  1. National Natural Science Foundation of China [21504017]
  2. Guangdong Natural Science Foundation [2016A030310339]
  3. Innovation Project of Education Department in Guangdong [2015KTSCX029]

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Herein, a novel photoinitiated polymerization-induced self-assembly formulation via photoinitiated reversible addition-fragmentation chain transfer dispersion polymerization of glycidyl methacrylate (PGMA) in ethanol-water at room temperature is reported. It is demonstrated that conducting polymerization-induced self-assembly (PISA) at low temperatures is crucial for obtaining colloidal stable PGMA-based diblock copolymer nano-objects. Good control is maintained during the photo-PISA process with a high rate of polymerization. The polymerization can be switched between ON and OFF in response to visible light. A phase diagram is constructed by varying monomer concentration and degree of polymerization. The PGMA-based diblock copolymer nano-objects can be further cross-linked by using a bifunctional primary amine reagent. Finally, silver nano-particles are loaded within cross-linked vesicles via in situ reduction, exhibiting good catalytic properties.

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