Journal
MACROMOLECULAR RAPID COMMUNICATIONS
Volume 38, Issue 15, Pages -Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/marc.201700195
Keywords
diblock copolymer; epoxy-functional; photo-PISA; poly(glycidyl methacrylate)
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Funding
- National Natural Science Foundation of China [21504017]
- Guangdong Natural Science Foundation [2016A030310339]
- Innovation Project of Education Department in Guangdong [2015KTSCX029]
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Herein, a novel photoinitiated polymerization-induced self-assembly formulation via photoinitiated reversible addition-fragmentation chain transfer dispersion polymerization of glycidyl methacrylate (PGMA) in ethanol-water at room temperature is reported. It is demonstrated that conducting polymerization-induced self-assembly (PISA) at low temperatures is crucial for obtaining colloidal stable PGMA-based diblock copolymer nano-objects. Good control is maintained during the photo-PISA process with a high rate of polymerization. The polymerization can be switched between ON and OFF in response to visible light. A phase diagram is constructed by varying monomer concentration and degree of polymerization. The PGMA-based diblock copolymer nano-objects can be further cross-linked by using a bifunctional primary amine reagent. Finally, silver nano-particles are loaded within cross-linked vesicles via in situ reduction, exhibiting good catalytic properties.
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