4.7 Article

Investigation of F doped SnO2 thin films properties deposited via ultrasonic spray technique for several applications

Journal

SURFACES AND INTERFACES
Volume 15, Issue -, Pages 244-249

Publisher

ELSEVIER
DOI: 10.1016/j.surfin.2019.04.001

Keywords

FTO; Thin film; Ultrasonic spray; Structural properties; Optical properties; Electrical properties

Funding

  1. Algiers Research Center of Nuclear(CRNA), Algeria
  2. Hungarian Academy of Sciences Center for Energy Research(MTA EK)

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Previous studies have shown that pure SnO2 thin films have low electrical and optical properties. These poor properties of the SnO2 can be enhanced by adding the appropriate percentage of fluorine. In this work, F-SnO2 thin films of high conductivity and transmittance have been prepared in the University of Biskra using chemical ultrasonic spray technique. Many characterization techniques such as XRD, SEM, UV-visible, PL and 4-point, have been used to determinate the morphology, texture coefficient, grain size, dislocation, transmittance and the conductivity of the prepared F-SnO2 films. Our XRD results show that the F-SnO2 still have the same rutile structure as the pure SnO2 but with better crystallization. The injection of fluorine increases the transmittance up to 84%, and the conductivity to about 8.11 x 10(2) Omega.cm(-1), with high figure of merit value about 9 x 10(-3) Omega(-1).

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