4.4 Article

Communication-Black GaAs with Sub-Wavelength Nanostructures Fabricated via Lithography-Free Metal-Assisted Chemical Etching

Journal

ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY
Volume 8, Issue 6, Pages Q134-Q136

Publisher

ELECTROCHEMICAL SOC INC
DOI: 10.1149/2.0311906jss

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Funding

  1. Intramural NIST DOC [9999-NIST] Funding Source: Medline

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A practical nanofabrication process is detailed for the generation of black GaAs. Discontinuous films of Au nanoparticles are electrodeposited onto GaAs substrates to catalyze site-specific etching in a solution consisting of KMnO4 and HF via the metal-assisted chemical etching. This provides a solution-based and lithography-free method for fabricating sub-wavelength nanostructure arrays that exhibit solar-weighted reflectance approaching 4%. This two-step benchtop process can be performed at room-temperature without lithography, vacuum instrumentation, or epitaxy, providing a high-throughput nanotexturing approach for photovoltaics applications. (c) 2019 The Electrochemical Society.

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