4.4 Article Proceedings Paper

Inflight Particle Behavior in the Vacuum Kinetic Spray Process

Journal

JOURNAL OF THERMAL SPRAY TECHNOLOGY
Volume 26, Issue 7, Pages 1616-1631

Publisher

SPRINGER
DOI: 10.1007/s11666-017-0614-x

Keywords

acceleration mechanism; computational fluid dynamics (CFD); deposition behavior; particle velocity; vacuum kinetic spraying (VKS) process

Funding

  1. National Research Foundation of Korea (NRF) - Korean Government (MEST) [NRF-2014R1A2A2A05007633]

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The vacuum kinetic spray (VKS) process, also-called aerosol deposition, is a promising spray technology by which a thin or thick film can be fabricated at room temperature. Although a number of relevant studies have been performed, almost all have focused on the development of various applications, and unfortunately, the deposition mechanism has not yet been clarified. In this respect, the particle velocity in the flow field in VKS is investigated as a first stage of research into the VKS deposition mechanism. In this research, after a simulation prototype was derived based on the experimental results, the particle average and impact velocities were estimated. In addition, the change in particle velocities with gas flow rates, particle size, and working distance was analyzed based on simulation analyses and microstructural evidence. As a result, the gas flow rate, particle size, and working distance affect the particle impact velocity and further deposition behavior and film microstructure.

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