Journal
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION
Volume 34, Issue 12, Pages 2243-2249Publisher
OPTICAL SOC AMER
DOI: 10.1364/JOSAA.34.002243
Keywords
-
Categories
Funding
- Marsden Fund of New Zealand (RSNZ Contract) [UOO1214]
- MacDiarmid Institute for Advanced Materials and Nanotechnology
Ask authors/readers for more resources
Dielectric waveguide resonant underlayers are employed in ultra-high NA interference photolithography to effectively double the depth of field. Generally a single high refractive index waveguiding layer is employed. Here multilayer Herpin effective medium methods are explored to develop equivalent multilayer waveguiding layers. Herpin equivalent resonant underlayers are shown to be suitable replacements provided at least one layer within the Herpin trilayer supports propagating fields. In addition, a method of increasing the intensity incident upon the photoresist using resonant overlayers is also developed. This method is shown to greatly enhance the intensity within the photoresist making the use of thicker, safer, non-absorbing, low refractive index matching liquids potentially suitable for large-scale applications. (C) 2017 Optical Society of America
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available