4.7 Article

Low thermal conductivity of atomic layer deposition yttria-stabilized zirconia (YSZ) thin films for thermal insulation applications

Journal

JOURNAL OF THE EUROPEAN CERAMIC SOCIETY
Volume 37, Issue 9, Pages 3131-3136

Publisher

ELSEVIER SCI LTD
DOI: 10.1016/j.jeurceramsoc.2017.03.045

Keywords

Yttria-stabilized zirconia (YSZ); Atomic layer deposition; Thermal insulation applications; Thermal conductivity; Time-domain thermoreflectance

Funding

  1. National Research Foundation of Korea (NRF) - Korea government (MSIP) [2016R1C1B2015317, NRF-015R1D1A1A01058963]
  2. National Research Foundation of Korea [2016R1C1B2015317] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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Thermal insulation applications have long required materials with low thermal conductivity, and one example is yttria (Y2O3)-stabilized zirconia (ZrO2) (YSZ) as thermal barrier coatings used in gas turbine engines. Although porosity has been a route to the low thermal conductivity of YSZ coatings, nonporous and conformal coating of YSZ thin films with low thermal conductivity may find a great impact on various thermal insulation applications in nanostructured materials and nanoscale devices. Here, we report on measurements of the thermal conductivity of atomic layer deposition-grown, nonporous YSZ thin films of thickness down to 35 nm using time-domain thermoreflectance. We find that the measured thermal conductivities are 1.35-1.5 W m(-1) K-1 and do not strongly vary with film thickness. Without any reduction in thermal conductivity associated with porosity, the conductivities we report approach the minimum, amorphous limit, 1.25 W m(-1) K-1, predicted by the minimum thermal conductivity model. (C) 2017 Elsevier Ltd. All rights reserved.

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