4.1 Review

Mn-doped topological insulators: a review

Journal

JOURNAL OF SEMICONDUCTORS
Volume 40, Issue 8, Pages -

Publisher

IOP PUBLISHING LTD
DOI: 10.1088/1674-4926/40/8/081507

Keywords

topological insulators; thin films; electron transport; anomalous Hall effect; magnetic doping

Funding

  1. National Key Research and Development Program [2016YFA0300600]
  2. National Science, Foundation of China [11604374, 61425015]
  3. National Basic Research Program of China [2015CB921102]
  4. Strategic Priority Research Program of Chinese Academy of Sciences [XDB28000000]

Ask authors/readers for more resources

Topological insulators (TIs) host robust edge or surface states protected by time-reversal symmetry (TRS), which makes them prime candidates for applications in spintronic devices. A promising avenue of research for the development of functional TI devices has involved doping of three-dimensional (3D) TI thin film and bulk materials with magnetic elements. This approach aims to break the TRS and open a surface band gap near the Dirac point. Utilizing this gapped surface state allows for a wide range of novel physical effects to be observed, paving a way for applications in spintronics and quantum computation. This review focuses on the research of 3D TIs doped with manganese (Mn). We summarize major progress in the study of Mn doped chalcogenide TIs, including Bi2Se3, Bi2Te3, and Bi-2(Te,Se)(3). The transport properties, in particular the anomalous Hall effect, of the Mn-doped Bi2Se3 are discussed in detail. Finally, we conclude with future prospects and challenges in further studies of Mn doped TIs.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.1
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available