Structural and electrochemical properties of spray deposited molybdenum trioxide (α-MoO3) thin films

Nanostructured molybdenum trioxide (alpha-MoO3) thin films were deposited to investigate effect of substrate temperature on microstructural, morphological, optical, electrical, and electrochemical properties of the alpha-MoO3 thin films. X-ray diffraction results indicated deposited alpha-MoO3 thin films are polycrystalline, crystallizes in orthorhombic structure, and crystalline quality improved with substrate temperature. Films show the optical band gap varied between 2.56 and 2.85 eV, the activation energy of the alpha-MoO3 thin films were found to be in the range of 0.15-0.30 eV. The measured electrochemical properties of alpha-MoO3 thin film electrode deposited at 673 K exhibits significantly improved supercapacitive performance in Na2SO4 (0.5 M) electrolyte about 73.61 F/g at current density 0.6 mA/cm(2) than the other deposition temperatures. The maximum energy density (11.13 Wh/kg) at the power density 10.54 kW/kg was observed.