High-accuracy bulk electronic bandmapping with eliminated diffraction effects using hard X-ray photoelectron momentum microscopy

A key benefit of angle-resolved photoelectron spectroscopy (ARPES) in the X-ray range is the significant increase of the information depth, thanks to the large inelastic mean-free-path of the escaping photoelectrons. In practice hard X-ray ARPES (HARPES) faces severe challenges by low cross sections, large photon momentum transfer, and in particular strong phonon scattering and photoelectron diffraction effects. Here, we show that these challenges can be overcome by extending ultra-efficient time-of-flight momentum microscopy into the hard X-ray regime. Phonon scattering destroys the initial momentum distribution but subsequent diffraction at the lattice imprints a pronounced Kikuchi-type pattern on the background signal. Moreover, the pattern of the valence electrons is modulated by diffraction as well. For the examples of the medium-weight element materials Mo and layered TiTe2, we demonstrate how comprehensive valence-band and core-level photoemission data taken under identical conditions can be used to effectively remove photoelectron diffraction effects in HARPES band maps.