New thin films of NiO doped with V2O5 for electrochromic applications

This paper reports on synthesis and characterization of new electrochromic thin films of NiO doped with V2O5 that were prepared by the sol-gel method and deposited by the spin coating technique. The confirmation of the presence of the dopant in the structure of the films was given by energy-dispersive X-ray spectroscopy (EDX). The effect of the addition of vanadium to the films of NiO was evaluated by electrochemical techniques such as cyclic voltammetry, chronocoulometry, and chronoamperometry in 0.5 mol/L KOH electrolyte. The morphology and the structure of the films, determined by microscopies (SEM and AFM), reveal smooth and slightly rough surfaces. The addition of vanadium as a dopant does not produce changes in the host NiO matrix as evidenced by X-ray diffractometry (XRD). However, the addition of the dopant causes a significant improvement in a charge density values of the films that increase more than twice from 25.5 mC/cm(2) for NiO to 52.8 mC/cm(2) for NiO with 10 mol % of V2O5. V2O5 doping of NiO films also improved their optical properties as well as kinetics of insertion and extraction processes.