Journal
JOURNAL OF PHYSICAL CHEMISTRY LETTERS
Volume 8, Issue 23, Pages 5891-5897Publisher
AMER CHEMICAL SOC
DOI: 10.1021/acs.jpclett.7b02808
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- JST ERATO, Japan [JPMJER1305]
- Grants-in-Aid for Scientific Research [16K17972, 16H04192] Funding Source: KAKEN
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The influences of film density and molecular orientation on the carrier conduction and air stability of vacuum-deposited amorphous organic films of N,N'-di(1-naphthyl)-N,N'-diphenyl-(1,1'-biphenyl)-4,4'-diamine (alpha-NPD) were investigated. The substrate temperature (T-sub) during vacuum deposition had different effects on the film density and molecular orientation of alpha-NPD. Film density was a concave function of T-sub; maximum density was attained at T-sub, = 270-300 K. alpha-NPD molecules were randomly oriented at T-sub, = 342 K, and their horizontal orientation on the substrate became dominant as T-sub:, decreased. Hole current and air stability were clearly raised by increasing the film density by 1 to 2%; these effects were, respectively, attributed to carrier hopping between neighboring alpha-NPD molecules and suppressed penetration of oxygen and water. These results imply that increasing film density is more effective to enhance the electrical performance of organic thin-film devices with alpha-NPD films than control of molecular orientation.
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