MHD FLOW OF CHEMICALLY REACTING WILLIAMSON FLUID OVER A CURVED/FLAT SURFACE WITH VARIABLE HEAT SOURCE/SINK

In the current scrutiny, we bestowed dual solutions of MHD flow of Williamson fluid over a curved sheet. We imagine that the fluid motion is laminar and time dependent. This analysis is carried out subject to variable heat generation/absorption, radiation, and chemical reaction. The modeled equations are transformed as dimensionless and solved using the fourth-order Runge-Kutta-based shooting technique. Various flow fields are analyzed through graphs. Furthermore, numerical values are presented for the skin friction coefficient and local Nusselt and Sherwood numbers. The outcomes indicate that the temperature and concentration distributions are increasing functions of curvature parameter. Also, the velocity field is declared as a reducing function of both unsteadiness and Williamson fluid parameters.