Journal
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
Volume 29, Issue 2, Pages 1658-1663Publisher
SPRINGER
DOI: 10.1007/s10854-017-8078-9
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The microstructures of Zn2SnO4 thin films were examined with a view to their exploitation for gas sensor. Zn2SnO4 thin films were prepared using the radio frequency magnetron sputtering with various annealing temperatures. Zn2SnO4 thin films were analyzed by X-ray diffraction and microstructural observations. The Zn2SnO4 thin films that were annealed at 700 and 900 degrees C contained second phase of ZnSnO3 and SnO2, respectively. The cross-sectional SEM image of a Zn2SnO4 thin film that were annealed at 700 degrees C showed a dense film lacking voids throughout the bulk. A carbon monoxide interdigitated-capacitor gas sensor, based on a n-type Zn2SnO4 thin film was realized. The capacitance of the sensor device increases linearly with concentration of carbon monoxide.
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