4.5 Article

Optical Properties of TiO2 Films Deposited by Reactive Electron Beam Sputtering

Journal

JOURNAL OF ELECTRONIC MATERIALS
Volume 46, Issue 10, Pages 6089-6095

Publisher

SPRINGER
DOI: 10.1007/s11664-017-5552-3

Keywords

TiO2; film; RHEED; AFM; spectroscopic ellipsometry; optical constant

Funding

  1. Russian Science Foundation [14-19-00192]
  2. Ministry of Education and Science of the Russian Federation [RFMEFI57514X0027, 4.1346.2017/PP]
  3. RFBR [16-52-48010, 17-52-53031]
  4. Government of the Russian Federation [02.A03.21.0011]
  5. Russian Science Foundation [17-19-00020] Funding Source: Russian Science Foundation

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Titanium dioxide (anatase, a-TiO2) films have been prepared by electron beam sputtering of a TiO2 target in reactive atmosphere and their structural, microstructural, and optical properties were evaluated by reflection high- energy electron diffraction (RHEED) and x-ray diffraction (XRD) analyses, atomic force microscopy (AFM), and spectroscopic ellipsometry (SE). Different reflection models for determination of film optical parameters were tested and compared. The dispersive optical parameters were defined using the Tauc-Lorentz model by SE in the photon energy range of E = 1.12-4.96 eV. The films were transparent at E < 3 eV, but noticeable absorption was detected at E > 3 eV. The bandgap was estimated at the level of E (g) ae 3.44 eV.

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