4.4 Article

Feeding of liquid silicon for high performance multicrystalline silicon with increased ingot height and homogenized resistivity

Journal

JOURNAL OF CRYSTAL GROWTH
Volume 463, Issue -, Pages 145-150

Publisher

ELSEVIER
DOI: 10.1016/j.jcrysgro.2017.02.016

Keywords

Directional solidification; Crystal structure; Liquid feeding; Semiconducting silicon

Funding

  1. German Federal Ministry for the Economy and Energy [FKZ 0325491]

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Feeding of liquid silicon during the directional solidification process is a promising opportunity for cost reduction by increased throughput and improved material homogeneity due to constant resistivity over ingot height. In this work, a liquid feeding apparatus was developed for an industrial type directional solidification furnace. One n-type G2 sized High Performance multicrystalline ingot with liquid feeding of additional 14 kg of undoped silicon feedstock was crystallized. The resistivity was kept within a range of +/- 0.1 Omega cm of the target resistivity during the feeding sequence. A smaller mean grain area growth was observed during feeding, whereas the area fraction of recombination active dislocation structures was as low as in a reference ingot. Increased interstitial oxygen and substitutional carbon concentrations were measured for the ingot with liquid feeding. The measured mean bulk lifetime of 190 mu s for passivated wafers in the feeding sequence can probably be increased by further pre-melting crucible improvements. For this laboratory experiment, energy reductions of 2% per wafer and time savings of 16% per wafer were realized. (C) 2017 Elsevier B.V. All rights reserved.

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