Journal
JOURNAL OF APPLIED PHYSICS
Volume 122, Issue 12, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/1.5004128
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- Industrial Focus Group XUV Optics at the MESA+Institute for Nanotechnology at the University of Twente
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We have investigated the thermal stability of La/B-based (LaN/La/B) multilayer structures with partial-layer nitridation of La, a method shown earlier to result in enhanced reflectivity. The structures were annealed in the temperature range 100-500 degrees C for 70 h. They showed period drifts by 0.005 nm at 100 degrees C to 0.06 nm at 500 degrees C. A reflectivity loss of more than 2% was only observed after annealing above 300 degrees C. The study included separate investigation of B-on-LaN and LaN-on-La-on-B interfaces. Published by AIP Publishing.
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