4.7 Article

CMOS-compatible a-Si metalenses on a 12-inch glass wafer for fingerprint imaging

Journal

NANOPHOTONICS
Volume 9, Issue 4, Pages 823-830

Publisher

WALTER DE GRUYTER GMBH
DOI: 10.1515/nanoph-2019-0470

Keywords

metasurface; glass wafer; metalens

Funding

  1. RIE2020 Advanced Manufacturing and Engineering Domain's Core Funds: SERC Strategic Funds [A1818g0028]

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Metalenses made of artificial sub-wavelength nanostructures have shown the capability of light focusing and imaging with a miniaturized size. Here, we report the demonstration of mass-producible amorphous silicon metalenses on a 12-inch glass wafer via the complementary metal-oxide-semiconductor compatible process. The measured numerical aperture of the fabricated metalens is 0.496 with a focusing spot size of 1.26 mu m at the wavelength of 940 nm. The metalens is applied in an imaging system to test the imaging resolution. The minimum bar of the resolution chart with a width of 2.19 mu m is clearly observed. Furthermore, the same system demonstrates the imaging of a fingerprint, and proofs the concept of using metalens array to reduce the system size for future compact consumer electronics.

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