4.8 Article

Dual-channel type tunable field-effect transistors based on vertical bilayer WS2(1-x)Se2x/SnS2 heterostructures

Journal

INFOMAT
Volume 2, Issue 4, Pages 752-760

Publisher

WILEY
DOI: 10.1002/inf2.12071

Keywords

dual channel; field-effect transistor; heterostructure; semiconductor alloy; two-dimensional materials

Funding

  1. National Natural Science Foundation of China [51525202, 51902098, 51772084, 61574054, 51972105]

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Layered semiconductor heterostructures are essential elements in modern electronic and optoelectronic devices. Dynamically engineering the composition of these heterostructures may enable the flexible design of the properties of heterostructure-based electronics and optoelectronics as well as their optimization. Here, we report for the first time a two-step chemical vapor deposition approach for a series of WS2(1-x)Se2x/SnS2 vertical heterostructures with high-quality and large areas. The steady-state photoluminescence results exhibit an obvious composition-related quenching ratio, revealing a strong coherence between the band offset and the charge transfer efficiency at the junction interface. Based on the achieved heterostructures, dual-channel back-gate field-effect transistors were successfully designed and exhibited typical composition-dependent transport behaviors, and pure n-type unipolar transistors to ambipolar transistors were realized in such systems. The direct vapor growth of these novel vertical WS2(1-x)Se2x/SnS2 heterostructures could offer an interesting system for probing new physical properties and provide a series of layered heterostructures for high-quality devices. image

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