Journal
CURRENT APPLIED PHYSICS
Volume 15, Issue 9, Pages 1005-1009Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.cap.2015.06.002
Keywords
RRAM; CBRAM; Resistive switching; TaOx; Conductive filament
Funding
- National Research Foundation (NRF) of Korea - Korean Government [NRF-2014M3A7B4049367]
- NRF of MEST, Republic of Korea [NRF-2014049368]
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Forming-free and self-compliant bipolar resistive switching is observed in Cu/TaOx/TiN conductive bridge random access memory. Generally, Pt has been investigated as an inert electrode. However, Pt is not desirable material in current semiconductor industry for mass production. In this study, all electrodes are adapted to complementary metal-oxide-semiconductor compatible materials. The self-compliant resistive switching is achieved via usage of TiN bottom electrode. Also, dissolved Cu ions in TaOx lead to forming-free resistive switching behavior. The resistive switching mechanism is formation and rupture of combined oxygen vacancy/metallic copper conductive filament. We propose that Cu/TaOx/TiN is a promising candidate for a conductive bridge random access memory structure. (C) 2015 Elsevier B.V. All rights reserved.
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