Corrosion in Solutions of Mineral Acids of Ti-B-N Thin Films Obtained by Reactive Magnetron Sputtering

The interaction of thin Ti-B-N films obtained by magnetron reactive sputtering of a TiB2 target was studied in an atmosphere of a gas argon-nitrogen mixture (85 vol % Ar + 15 vol % N-2), with mineral acids (HCl, H2SO4, H3PO4, HNO3). It was found that the hexagonal boron nitride formed during the deposition process, along with titanium nitride, forms a resistant protective film that protects the bulk (similar to 85%) of the film from corrosion.