Journal
APPLIED PHYSICS LETTERS
Volume 117, Issue 19, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/5.0029286
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Funding
- Strategic Information and Communications RAMP
- D Promotion Program (SCOPE) of the Ministry of Internal Affairs and Communications, Japan
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Strong accumulation of Si impurities has been observed at a Ga2O3 epilayer/substrate interface. The highly Si-doped region around the interface typically becomes a current conduction path, causing buffer leakage for lateral Ga2O3 field-effect transistors (FETs). To overcome the drawback, we performed Mg- or Fe-ion implantation doping into a Ga2O3 substrate prior to the subsequent molecular-beam epitaxy growth to compensate the accumulated Si donors at the interface. The Mg implantation doping showed a minimal effect on reduction in the interface leakage, irrespective of its concentration. On the other hand, the Fe doping with a high density of 2x10(19)cm(-3) provided a significant decrease in the leakage and decent FET characteristics.
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