4.6 Article

Charge Trap Transistor (CTT): An Embedded Fully Logic-Compatible Multiple-Time Programmable Non-Volatile Memory Element for High-k-Metal-Gate CMOS Technologies

Journal

IEEE ELECTRON DEVICE LETTERS
Volume 38, Issue 1, Pages 44-47

Publisher

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2016.2633490

Keywords

High-k-metal-gate; CMOS; embedded non-volatile memory

Funding

  1. DARPA [FA 8650-16-C-7648]
  2. Global-Foundries

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The availability of on-chip non-volatile memory for advanced high-k-metal-gate CMOS technology nodes has been limited due to integration and scaling challenges as well as operational voltage incompatibilities, while its need continues to grow rapidly in modern high-performance systems. By exploiting intrinsic device self-heatingenhancedcharge trapping in as fabricated highk- metal-gate logic devices, we introduce a unique multipletime programmable embedded non-volatile memory element, called the 'charge trap transistor' (CTT), for high-k-metal-gateCMOS technologies. Functionality and feasibility of using CTT memory devices have been demonstrated on 22 nm planar and 14 nm FinFET technology platforms, including fully functional product prototype memory arrays. These transistor memory devices offer high density (similar to 0.144 mu m(2)/bit for 22 nm and similar to 0.082 mu m(2)/bit for 14 nm technology), logic voltage compatible and low peak power operation (similar to 4mW), and excellent retention for a fully integrated and scalable embedded non-volatile memory without added process complexity or masks.

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