Journal
IEEE ELECTRON DEVICE LETTERS
Volume 38, Issue 5, Pages 580-583Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2017.2681204
Keywords
Positive bias stress (PBS); InGaZnO thin-film transistor; self-aligned coplanar structure
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Funding
- LG Display Company
- National Research Foundation of Korea through the Korean Government (MSIP) [2016R1A5A1012966, 2015M3D1A1068061]
- SILVACO
- IC Design Education Center
- National Research Foundation of Korea [2016R1A5A1012966, 2015M3D1A1068061] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
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We propose an experimental method to decompose the positive gate-bias stress (PBS)induced threshold voltage shift (Delta V-th) of amorphous InGaZnO (a-IGZO) thin-film transistors (TFTs) into the contributions of distinct degradation mechanisms. Topgate self-aligned coplanar structure TFTs are used for this letter. Stress-time-divided measurements, which combine the subgap density-of-states (DOS) extraction and the analysis on recovery characteristics, are performed to separate the Delta V-th components. Change in excess oxygen (O-ex)-related DOS is clearly observed, and Delta V-th by PBS is quantitatively decomposed into the contributions of the active O-ex, and the deep and shallow gate insulator traps. The quantitative decomposition of PBS-induced Delta V-th provides physical insight and key guidelines for PBS stability optimization of a-IGZO TFTs.
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