4.6 Article

P-GaN HEMTs Drain and Gate Current Analysis Under Short-Circuit

Journal

IEEE ELECTRON DEVICE LETTERS
Volume 38, Issue 4, Pages 505-508

Publisher

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2017.2665163

Keywords

GaN HEMTs; p-GaN; short-circuit; reliability

Funding

  1. Spanish MINECO [TEC2011-22607, TEC2014-51903-R, RYC-2010-07434, PCIN-2014-057]
  2. AGAUR Funds [2014-SGR 1596]
  3. BSH Fair Cooking Project

Ask authors/readers for more resources

Gallium Nitride High-Electron-Mobility Transistors (GaN HEMTs) are promising devices for high-frequency and high-power density converters, but some of their applications (e.g., motor drives) require high robustness levels. In this scenario, 600 V normally-off p-GaN gate HEMTs are studied under Short-Circuit (SC) by experiment and physics-based simulations (drift-diffusion and thermodynamic models). A strong drain current reduction (> 70% after saturation peak) and high gate leakage current (tens of mA) are observed. All studied devices withstand the SC test at bus voltages up to 350 V, while fail at 400 V. Furthermore, its understanding is crucial to improving SC ruggedness in p-GaN HEMTs.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.6
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available