Structural and Optical Properties of Ni Implanted NiO Thin Films

We have studied the structural and optical properties of Ni implanted NiO thin films deposited on quartz substrate by electron beam evaporation method at room temperature for different fluences. The structural and optical properties of pristine and implanted NiO thin films were investigated using X-ray diffraction (XRD) and ultravioletvisible spectrometer respectively. We observed decrease in crystallinity and an induced stress for implantation at low fluence whereas there is relaxation and improvement incrystallinity at high fluence. However, the optical transmission and band gap decreases monotonically with the increase of implantation fluences.