4.7 Article

Long catalyst-free InAs nanowires grown on silicon by HVPE

Journal

CRYSTENGCOMM
Volume 23, Issue 2, Pages 378-384

Publisher

ROYAL SOC CHEMISTRY
DOI: 10.1039/d0ce01385d

Keywords

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Funding

  1. Region Auvergne Rhone-Alpes
  2. Pack ambition recherche [17 011236 01-61617]
  3. Natural Sciences and Engineering Research Council of Canada
  4. Russian Science Foundation [19-72-30004]

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In this study, long InAs nanowires (26 μm) were successfully grown on Si(111) substrate using HVPE method at a standard rate of 50 μm h(-)(1). The nanowires exhibited vertical growth along the (111)B direction with a well-faceted hexagonal shape and constant diameter. The growth temperature and III/V ratio were found to have significant effects on the growth process, with the mechanisms involving direct condensation of InCl and As-4/As-2 gaseous species being identified.
We report for the first time on the hydride vapor phase epitaxy (HVPE) growth of long (26 mu m) InAs nanowires on Si(111) substrate grown at a standard rate of 50 mu m h(-)(1). The nanowires grow vertically along the (111)B direction and exhibit a well faceted hexagonal shape with a constant diameter. The effect of the experimental parameters, growth temperature and III/V ratio, is investigated. The thermodynamic and kinetic mechanisms involved during the growth of such long nanowires are identified. It is demonstrated that growth occurs through direct condensation of InCl and As-4/As-2 gaseous species. Dechlorination of adsorbed InCl molecules is the limiting step at low temperature. Structural analysis through high resolution transmission electron microscopy (HRTEM) and high-angle annular dark-field (HAADF) imaging was performed. The high As-4 partial pressure of the HVPE environment induces the presence of both wurtzite and zinc-blende phases. The results emphasize the potential of the low cost HVPE technique for the monolithic integration of arrays of long InAs nanowires on silicon.

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