4.7 Article

Radical-triggered cross-linking for molecular layer deposition of SiAlCOH hybrid thin films

Journal

CHEMICAL COMMUNICATIONS
Volume 57, Issue 17, Pages 2160-2163

Publisher

ROYAL SOC CHEMISTRY
DOI: 10.1039/d0cc07858a

Keywords

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Funding

  1. Spanish Ministry of Science and Innovation (MICINN) [PID2019-111065RB-I00]
  2. FEDER funds
  3. Maria de Maeztu Units of Excellence Programme [MDM-2016-0618]
  4. EU [765378]
  5. Russian Federation government [FZNZ-2020-0002]
  6. University of Rijeka [18-144]

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This study presents a simultaneous growth and radical-initiated cross-linking of a hybrid thin film using molecular layer deposition (MLD) in a layer-by-layer manner. The cross-linked film demonstrates a self-limiting MLD growth behavior, as well as improved properties such as higher film density and enhanced stability compared to non-cross-linked films.
Here, we report on a simultaneous growth and radical-initiated cross-linking of a hybrid thin film in a layer-by-layer manner via molecular layer deposition (MLD). The cross-linked film exhibited a self-limiting MLD growth behavior and improved properties like 12% higher film density and enhanced stability compared to the non-cross-linked film.

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