Composition and properties of RF-sputter deposited titanium dioxide thin films

The photocatalytic properties of titania (TiO2) have prompted research utilising its useful ability to convert solar energy into electron-hole pairs to drive novel chemistry. The aim of the present work is to examine the properties required for a synthetic method capable of producing thin TiO2 films, with well defined, easily modifiable characteristics. Presented here is a method of synthesis of TiO2 nanoparticulate thin films generated using RF plasma capable of homogenous depositions with known elemental composition and modifiable properties at a far lower cost than single-crystal TiO2. Multiple depositions regimes were examined for their effect on overall chemical composition and to minimise the unwanted contaminant, carbon, from the final film. The resulting TiO2 films can be easily modified through heating to further induce defects and change the electronic structure, crystallinity, surface morphology and roughness of the deposited thin film.

Automated summary

The research aims to examine the properties required for producing thin films of TiO2 using RF plasma, with the ability to modify the films through heating to induce defects and change their characteristics. Different deposition regimes were studied to minimize unwanted contaminants and the resulting TiO2 films showed a lower cost alternative to single-crystal TiO2 with known elemental composition and modifiable properties.