Journal
MATERIALS HORIZONS
Volume 8, Issue 7, Pages 1976-1984Publisher
ROYAL SOC CHEMISTRY
DOI: 10.1039/d1mh00286d
Keywords
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Funding
- National Natural Science Foundation of China (NSFC) [62074048, 61675062]
- Fundamental Research Founds for the Central Universities [PA2020GDKC0014, JZ2018HGPB0275]
- Open Foundation of Anhui Provincial Key Laboratory of Advanced Functional Materials and Devices [4500-411104/011]
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A new wavelength sensor with the capability to accurately distinguish wavelengths in the UV-NIR range has been reported in this study. The sensor demonstrates low error rates and high accuracy, with extensive analysis conducted to reveal the factors influencing its performance.
A wavelength sensor as a representative optoelectronic device plays an important role in many fields including visible light communication, medical diagnosis, and image recognition. In this study, a wavelength-sensitive detector with a new operation mechanism was reported. The as-proposed wavelength sensor which is composed of two parallel PtSe2/thin Si Schottky junction photodetectors is capable of distinguishing wavelength in the range from ultraviolet to near infrared (UV-NIR) light (265 to 1050 nm), in that the relationship between the photocurrent ratio of both photodetectors and incident wavelength can be numerically described by a monotonic function. The unique operation mechanism of the thin Si based wavelength sensor was unveiled by theoretical simulation based on Synopsys Sentaurus Technology Computer Aided Design (TCAD). Remarkably, the wavelength sensor has an average absolute error of +/- 4.05 nm and an average relative error less than +/- 0.56%, which are much better than previously reported devices. What is more, extensive analysis was performed to reveal how and to what extent the working temperature and incident light intensity, and the thickness of the PtSe2 layer will influence the performance of the wavelength sensor.
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