Laser Thermal Processing of Group IV Semiconductors for Integrated Photonic Systems

In the quest to expand the functionality and capacity of group IV semiconductor photonic systems, new materials and production methods are constantly being explored. In particular, flexible fabrication and postprocessing approaches that are compatible with different materials and allow for tuning of the components and systems are of great interest. Within this research area, laser thermal processing has emerged as an indispensable tool that can be applied to enhance and/or modify the material, structural, electrical and optical properties of group IV elemental and compound semiconductors at various stages of the production process. Herein, the recent progress made in the application of laser processing techniques to develop integrated semiconductor systems in both fiber- and planar-based platforms is evaluated. Laser processing has allowed for the production of semiconductor waveguides with high crystallinity in the core and low optical losses, as well as postfabrication trimming of device characteristics and direct writing of tunable strain and composition profiles for bandgap engineering and optical waveguiding. For each platform, the current challenges and opportunities for the future development of laser-processed integrated semiconductor photonic systems are presented.

Automated summary

The research explores the application of laser thermal processing in group IV semiconductor photonic systems, involving flexible manufacturing and postprocessing methods, as well as compatibility with different materials. Laser processing has enabled the production of semiconductor waveguides with high crystallinity and low optical losses, allowing for post-fabrication trimming of device characteristics and direct writing of tunable strain and composition profiles for bandgap engineering and optical waveguiding.