Journal
RSC ADVANCES
Volume 11, Issue 40, Pages 25038-25046Publisher
ROYAL SOC CHEMISTRY
DOI: 10.1039/d1ra02896k
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Funding
- Basic Research Fund of Khon Kaen University
- Research and Graduate Studies, Khon Kaen University
- Research Network NANOTEC (RNN) program of the National Nanotechnology Center (NANOTEC)
- NSTDA, Ministry of Higher Education, Science, Research and Innovation (MHESI)
- Khon Kaen University, Thailand [P1851882]
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The CaCu3Ti4O12 and CaCu2.95Mg0.05Ti3.95Al0.05O12 ceramics were fabricated using a solid-state reaction method, both showing a single-phase of CaCu3Ti4O12. Co-doping with Mg and Al resulted in significant grain size expansion and improved dielectric properties in the ceramics, with high dielectric permittivity and low loss tangent achieved in the CaCu2.95Mg0.05Ti3.95Al0.05O12 ceramic. Experimental and computational results suggest that the enhanced dielectric properties in the co-doped ceramic may be attributed to improved grain boundary responses, particularly from metastable phases and oxygen enrichment at the grain boundaries.
CaCu3Ti4O12 and CaCu2.95Mg0.05Ti3.95Al0.05O12 ceramics were fabricated via a solid-state reaction method. A single-phase of CaCu3Ti4O12 was found in these two ceramics. Very great grain size expansion was produced by co-doping with Mg2+ and Al3+. DFT results indicate that both Mg and Al atoms preferentially occupy Cu sites, creating liquid-phase sintering decomposition at grain boundary layers. Very high dielectric permittivity of similar to 58 397 and low loss tangent of about 0.047 were achieved in a CaCu2.95Mg0.05Ti3.95Al0.05O12 ceramic. Additionally, the temperature stability of the dielectric response was improved. Better dielectric properties in the co-doped ceramic have possible origins from enhanced grain boundary responses, especially from the influences of metastable phases and oxygen enrichment at the grain boundaries. Experimental and computational results indicate that the colossal dielectric properties in CaCu3Ti4O12 ceramics might be correlated with an internal barrier layer capacitor structure.
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