Journal
2021 14TH IEEE INTERNATIONAL CONFERENCE ON INDUSTRY APPLICATIONS (INDUSCON)
Volume -, Issue -, Pages 266-269Publisher
IEEE
DOI: 10.1109/INDUSCON51756.2021.9529918
Keywords
Topology Optimization; Simulated Annealing; Manufacturing constraints; Microfabrication; Wet etching; Lithography
Funding
- CNPq [305.959/2016-6]
- CAPES/PROAP [817.757/38.860]
- FAPESP [2019/03453-2]
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This paper introduces a non-gradient topology optimization method developed with simulated annealing combined with density filter and morphology operators to address manufacturing limitations in the microfabrication process. The results of topology optimization on a cantilever beam show minimal changes in system performance when applying microfabrication constraints through morphology operators and density filters.
In this paper, a non-gradient topology optimization method developed with simulated annealing combined with density filter and morphology operators. The presented method can address the manufacturing limitations of microfabrication process. The minimum feature size and sharp edges which are the main limits in the lithography and etching processes are considered in this algorithm. The results of topology optimization of a cantilever beam used to verify this method and show the changes in topology. The final results after applying morphology operators and density filters do not make a big change in the performance of the system while applying the microfabrication constraints.
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