4.7 Article Proceedings Paper

Step-scheme ZnO@ZnS hollow microspheres for improved photocatalytic H2 production performance

Journal

CHINESE JOURNAL OF CATALYSIS
Volume 43, Issue 2, Pages 329-338

Publisher

ELSEVIER
DOI: 10.1016/S1872-2067(21)63889-5

Keywords

ZnO@ZnS; Hollow microspheres; Step-scheme heterojunction; Photocatalytic H-2 production

Funding

  1. National Natural Science Foundation of China [22075072, 52003079]
  2. Guangdong Basic and Applied Basic Research Foundation [2020A1515110873]
  3. Shenzhen Fundamental Research Program [JCYJ20190813113408912]
  4. Natural Science Foundation of Top Talent of SZTU [2019211]
  5. Hubei Provincial Natural Science Foundation of China [2019CFB568]
  6. 2020 National Undergraduate Training Programs for Innovation and Entrepreneurship

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Constructing a step-scheme heterojunction is an efficient way to optimize the performance of a photocatalytic system, and in this study, a ZnO@ZnS step-scheme photocatalyst was successfully prepared with superior performance and efficient charge carrier separation.
Constructing a step-scheme heterojunction at the interface between two semiconductors is an efficient way to optimize the redox ability and accelerate the charge carrier separation of a photocatalytic system for achieving high photocatalytic performance. In this study, we prepared a hierarchical ZnO@ZnS step-scheme photocatalyst by incorporating ZnS into the outer shell of hollow ZnO microspheres via a simple in situ sulfidation strategy. The ZnO@ZnS step-scheme photocatalysts had a large surface area, high light utilization capacity, and superior separation efficiency for photogenerated charge carriers. In addition, the material simulation revealed that the formation of the step-scheme heterojunction between ZnO and ZnS was due to the presence of the built-in electric field. Our study paves the way for design of high-performance photocatalysts for H-2 production. (C) 2022, Dalian Institute of Chemical Physics, Chinese Academy of Sciences. Published by Elsevier B.V. All rights reserved.

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