4.2 Article

Experimental study on reciprocating magnetorheological polishing

Related references

Note: Only part of the references are listed.
Article Chemistry, Physical

A novel slurry for chemical mechanical polishing of single crystal diamond

Longxing Liao et al.

Summary: This study investigated the influence of CMP slurries with different pH values and oxidants on the quality of polished SCD surface, and found that the optimal slurry achieved the lowest surface roughness. The CMP mechanism was elucidated by XPS and IR spectroscopy, showing that hydroxyl radicals and hydrogen ions played a crucial role in achieving an ultra-smooth SCD surface.

APPLIED SURFACE SCIENCE (2021)

Article Chemistry, Analytical

Study on Material Removal Model by Reciprocating Magnetorheological Polishing

Rensheng Wang et al.

Summary: A new reciprocating magnetorheological polishing (RMRP) method for flat workpieces was proposed in this study. It was found that the rotational speed of the workpiece had a greater impact on material removal rate (MRR) compared to the eccentric wheel speed and eccentricity. The experimental results validated the MRR model and showed significant improvement in surface roughness under specific technical parameters.

MICROMACHINES (2021)

Article Chemistry, Multidisciplinary

Green chemical mechanical polishing of sapphire wafers using a novel slurry

Wenxiang Xie et al.

NANOSCALE (2020)

Article Engineering, Manufacturing

Experimental investigations into transient roughness reduction in ball-end magneto-rheological finishing process

Faiz Iqbal et al.

MATERIALS AND MANUFACTURING PROCESSES (2019)

Article Engineering, Manufacturing

Synthesis of polishing fluid and novel approach for nanofinishing of copper using ball-end magnetorheological finishing process

Dilshad Ahmad Khan et al.

MATERIALS AND MANUFACTURING PROCESSES (2018)

Article Engineering, Mechanical

Experimental investigation of the magnetorheological polishing process with roller

Wanli Song et al.

INDUSTRIAL LUBRICATION AND TRIBOLOGY (2018)

Article Engineering, Mechanical

Magnetorheological fluid polishing using an electromagnet with straight pole-piece for improving material removal rate

Byung Chan Kim et al.

JOURNAL OF MECHANICAL SCIENCE AND TECHNOLOGY (2018)

Article Chemistry, Multidisciplinary

New Deformation-Induced Nanostructure in Silicon

Bo Wang et al.

NANO LETTERS (2018)

Article Engineering, Industrial

Changes in surface layer of silicon wafers from diamond scratching

Zhenyu Zhang et al.

CIRP ANNALS-MANUFACTURING TECHNOLOGY (2015)

Article Engineering, Manufacturing

Parametric analysis of an improved ball end magnetorheological finishing process

Anant Kumar Singh et al.

PROCEEDINGS OF THE INSTITUTION OF MECHANICAL ENGINEERS PART B-JOURNAL OF ENGINEERING MANUFACTURE (2012)