Journal
ADVANCED PHOTONICS RESEARCH
Volume 3, Issue 5, Pages -Publisher
WILEY
DOI: 10.1002/adpr.202100316
Keywords
deep ultraviolet; beta-Ga2O3 semiconductors; phototransistors; solar blindness; ultrawide bandgap
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Funding
- Energy Technology Development Program of the Korean Institute of Energy Technology Evaluation and Planning (KETEP) [20193091010240]
- National Research Foundation of Korea (NRF) - Korean government (MSIT) [2021R1A2C1010256]
- National Research Foundation of Korea [5199990714521, 2021R1A2C1010256] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
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This study explores the use of ultrawide bandgap beta-Ga2O3 in deep ultraviolet (DUV) photodetectors (PDs), which have great potential for various applications. A Sn-doped polycrystalline beta-Ga2O3 semiconductor is used as the channel material, showing normally off behavior with a positive threshold voltage under dark conditions. The 8 nm thick polycrystalline beta-Ga2O3 exhibits high-performance DUV detection capability with low dark current and high photo-to-dark-current ratio. This semiconductor has the potential to realize high-performance and low-power-consumption solar-blind PDs.
Deep ultraviolet (DUV) photodetectors (PDs) based on ultrawide bandgap beta-Ga2O3 have great potential for aerospace, military, and civilian applications, especially because of their inherent solar blindness. An 8 nm thick Sn-doped polycrystalline beta-Ga2O3 semiconductor is used as the channel material for a solar-blind PD in this study. The beta-Ga2O3 channel is fully depleted by upward bending of the energy band owing to the work function difference between the highly p-type Si (gate electrode) and beta-Ga2O3, resulting in normally off behavior with a positive threshold voltage under dark conditions. The normally off behavior is beneficial for simplicity of the gate-driver circuitry and low power consumption under standby conditions. The fully depleted 8 nm thick polycrystalline beta-Ga2O3 exhibits high-performance DUV detection capability of light at 215 nm: a low dark current of 29.3 pA and high photo-to-dark-current ratio of approximate to 10(4) at zero gate voltage. This fully depleted n-type beta-Ga2O3 semiconductor with a wafer-scale substrate can expedite the realization of high-performance and low-power-consumption solar-blind PDs.
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